张文妮 1,2,3曹红超 1,3孔钒宇 1,3张益彬 1,3[ ... ]邵建达 1,3,4
作者单位
摘要
1 中国科学院上海光学精密机械研究所薄膜光学实验室,上海 201800
2 中国科学院大学材料与光电研究中心,北京 100049
3 中国科学院上海光学精密机械研究所强激光材料重点实验室,上海 201800
4 中国科学院超强激光科学卓越创新中心,上海 201800
针对传统熔石英激光窗口在碱金属蒸气环境下易腐蚀的痛点问题,提出了在蓝宝石材料上制备增透微结构的方法,以实现耐高温、耐腐蚀的高透激光窗口。在理论仿真的基础上,采用干涉曝光与反应离子束刻蚀技术,在蓝宝石基底表面上制备了增透微结构,其对795 nm光的单面透过率达到99.23%。在此基础上,制备了双面增透微结构和一面增透微结构一面增透膜的蓝宝石窗口片,相较于蓝宝石基底,它们对795 nm光的透过率分别提升了12.13%和13.02%。高功率激光作用温升测试结果表明,当激光功率从35 W增加到99.6 W时,裸基板温度增加了5.9 ℃,但是双面增透样品的温升均为3.8 ℃,表明双面增透处理可以适当降低温升。同时,光束质量测试结果表明,当高功率激光作用下微结构窗口的温度控制在200 ℃以内时,双面增透样品的光束质量因子在横向上的变化小于0.05,在纵向上的变化小于0.06,表明该增透窗口对入射光光束质量的影响甚小。
薄膜 增透微结构 干涉曝光 反应离子束刻蚀 
中国激光
2023, 50(22): 2203101
Yuxing Han 1,2,3Hongchao Cao 1,3,6Fanyu Kong 1,3,6Yunxia Jin 1,3,4,6,*Jianda Shao 1,3,4,5,6
Author Affiliations
Abstract
1 Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China
3 Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai, China
4 CAS Center for Excellence in Ultra-Intense Laser Science, Chinese Academy of Sciences, Shanghai, China
5 Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, China
6 China-Russian Belt and Road Joint Laboratory on Laser Science, Shanghai, China
Maximizing the energy-loading performance of gratings is a universal theme in high-energy pulse compression. However, sporadic grating designs strongly restrict the development of high-power laser engineering. This study proposes an all- and mixed-dielectric grating design paradigm for Nd:glass-based pulse compressors. The solution regions are classified according to the line density. High diffraction efficiency solutions are described in more detail based on the dispersion amount and incident angle. Moreover, an energy scaling factor of 7.09 times larger than that of the National Ignition Facility’s Advanced Radiographic Capability (NIF-ARC) is obtained by taking advantage of the low electric field intensity at transverse magnetic polarization and a small incident angle. These results make a pioneering contribution to facilitate future 20–50-petawatt-class ultrafast laser systems.
all-dielectric grating high-peak-power laser large deviation angle Littrow configuration mixed metal-dielectric grating 
High Power Laser Science and Engineering
2023, 11(5): 05000e60
Yuanzhi Dong 1,2,3Yunxia Jin 1,3,4Fanyu Kong 1,3,*Jingyin Zhao 1,3[ ... ]Jianda Shao 1,2,3,4,5
Author Affiliations
Abstract
1 Thin Film Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
2 School of Physical Sciences, University of Science and Technology of China, Hefei, China
3 Key Laboratory of High Power Laser Materials, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
4 CAS Center for Excellence in Ultra-intense Laser Science, Chinese Academy of Sciences, Shanghai, China
5 Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, China
In this paper, a 2D angle amplifier based on peristrophic multiplexed volume Bragg gratings is designed and prepared, in which a calculation method is firstly proposed to optimize the number of channels to a minimum. The induction of peristrophic multiplexing reduces the performance difference in one bulk of the grating, whereas there is no need to deliberately optimize the fabrication process. It is revealed that a discrete 2D angle deflection range of ±30° is obtained and the relative diffraction efficiency of all the grating channels reaches more than 55% with a root-mean-square deviation of less than 3.4% in the same grating. The deviation of the Bragg incidence and exit angles from the expected values is less than 0.07°. It is believed that the proposed 2D angle amplifier has the potential to realize high-performance and large-angle beam steering in high-power laser beam scanning systems.
beam scanning high-power lasers volume Bragg gratings 
High Power Laser Science and Engineering
2023, 11(1): 01000e13
Jingyin Zhao 1,2,3Yunxia Jin 1,3,4,*Fanyu Kong 1,3Dongbing He 1,3[ ... ]Jianda Shao 1,3,4,5
Author Affiliations
Abstract
1 Thin Film Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
3 Key Laboratory of High Power Laser Materials, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
4 CAS Center for Excellence in Ultra-Intense Laser Science, Chinese Academy of Sciences, Shanghai 201800, China
5 Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China
Measuring the topological charge (TC) of optical vortex beams by the edge-diffraction pattern of a single plate is proposed and demonstrated. The diffraction fringes can keep well discernible in a wide three-dimensional range in this method. The redundant fringes of the diffracted fork-shaped pattern in the near-field can determine the TC value, and the orientation of the fork tells the handedness of the vortex. The plate can be opaque or translucent, and the requirement of the translucent plate for TC measurement is analyzed. Measurement of TCs up to ±40 is experimentally demonstrated by subtracting the upper and lower fringe numbers with respect to the center of the light. The plate is easy to get, and this feasible measurement can bring great convenience and efficiency for researchers.
optical vortex orbital angular momentum topological charge measurement 
Chinese Optics Letters
2022, 20(11): 110501
刘畅洋 1,2,3晋云霞 1,3,4,*曹红超 1,3孔钒宇 1,3[ ... ]邵建达 1,3,4
作者单位
摘要
1 中国科学院上海光学精密机械研究所薄膜光学实验室, 上海 201800
2 中国科学院大学材料与光电研究中心, 北京 100049
3 中国科学院上海光学精密机械研究所强激光材料重点实验室, 上海 201800
4 中国科学院超强激光科学卓越创新中心, 上海 201800
氟化钇薄膜由于具有优良的光学性能常被用于红外波段,通过优化磁控溅射工艺,成功地在锗基底上实现了厚度大于1 μm的氟化钇薄膜的制备,并分析了溅射功率对于氟化钇薄膜光学性能的影响。采用X射线衍射仪、X射线光电子能谱仪、傅里叶红外光谱仪和原子力显微镜对样品的物相结构、化学成分、光学常数和表面粗糙度进行了表征和系统分析。研究表明在200 W的溅射功率下能够制备出氧原子数分数低于6%,在2~8 μm波长范围内折射率高于1.6的低吸收氟化钇薄膜。
薄膜 氟化钇薄膜 磁控溅射 溅射功率 折射率 
中国激光
2021, 48(21): 2103001
戴慧芳 1,2,3陈鹏 1,2,3赵靖寅 1,2,3孙勇 1,2,3[ ... ]晋云霞 1,3,*
作者单位
摘要
1 中国科学院上海光学精密机械研究所薄膜光学实验室, 上海 201800
2 中国科学院大学材料与光电研究中心, 北京 100049
3 中国科学院强激光材料重点实验室, 上海 201800
基于矩阵法,构建超短脉冲经啁啾体布拉格光栅(CVBG)衍射的频域和时域响应分析模型。针对百飞秒(fs)级光纤啁啾脉冲放大(FCPA)系统对于CVBG的带宽要求,系统研究衍射带宽对CVBG的脉冲展宽及压缩效应的影响及宽带CVBG对于不同啁啾参数输入脉冲的脉冲响应特性。研究结果表明:CVBG的衍射带宽随其啁啾率和厚度增大而线性增大;当CVBG的衍射带宽小于入射脉冲的频谱宽度时,频谱成分的剪切会导致展宽脉冲的变形并使压缩脉冲相对于入射脉冲而展宽;为实现100 fs脉冲的展宽-压缩对易性,须保证CVBG衍射带宽不小于60 nm。设计中对单块厚度为40 mm的宽带CVBG先展宽再压缩,得到频谱宽度为16.64 nm的线性啁啾脉冲,输出脉冲均无限接近傅里叶变换受限(FTL)脉冲且衍射效率高达84%,这为百fs级CVBG脉冲压缩器的实现提供了理论参考及指导。
光栅 脉冲压缩 飞秒光纤激光器 矩阵法 
光学学报
2019, 39(10): 1005002
徐姣 1,2陈俊明 1,2陈鹏 1王勇禄 1[ ... ]邵建达 1
作者单位
摘要
1 中国科学院上海光学精密机械研究所高能激光材料重点实验室, 上海 201800
2 中国科学院大学, 北京 100049
前期通过实验和理论研究了960线合束光栅在不同功率密度激光辐照下的表面热畸变及远场光束质量,认为基底受热膨胀是导致合束光栅面形质量和光束质量下降的主要原因,但没有对合束光栅表面热量沉积和远场光束质量如何改善进行分析。通过模型改进分析了合束光栅在不同辐照功率密度下的表面温度、热畸变以及远场光束质量的变化,而且计算分析了基底厚度对合束光栅表面温度、热畸变以及远场光束质量的影响,并得出结论:增加基底厚度有利于提高合束光栅的功率耐受性以及衍射光斑的远场光束质量。
光栅 合束光栅 热畸变 光束质量 基底厚度 
光学学报
2018, 38(5): 0505002
张洪 1,2,*晋云霞 2孔钒宇 2黄昊鹏 1,2[ ... ]叶邦角 3
作者单位
摘要
1 中国科学院大学, 北京 100049
2 中国科学院上海光学精密机械研究所强激光材料重点实验室, 上海 201800
3 中国科学技术大学近代物理系核探测与核电子学国家重点实验室, 合肥 230026
对金属介质多层膜样品进行不同温度的退火处理。实验发现,当退火温度为350 ℃时,在样品Au层与SiO2层的界面处出现过渡层,样品具有很强的抗化学清洗能力。利用透射电子显微镜观测与能谱仪分析发现,过渡层的出现主要是Cr原子从Au层底部扩散到SiO2层的结果。过渡层可以增强Au层与SiO2层间的粘附力,阻挡酸溶液的渗入,使得金属介质多层膜的抗化学清洗能力得到增强。
材料 界面扩散 化学清洗 退火 粘附力 
中国激光
2016, 43(10): 1003002
Author Affiliations
Abstract
The fabricated gratings used for an 800-nm compressed laser pulse have more than 90% diffraction efficiency in the –1st order for TE polarization within 760–860 nm, and the maximum value is 94.3%. The laserinduced damage threshold (LIDT) of the gratings increases from 0.53 to 0.75 J/cm2 in the normal beam in a pulse width \tau of 40–100 fs. The LIDT of the gratings is observed a \tau^{0.25} scaling in the pulse width region. The damage morphologies of the gratings indicate that the initial damage of the gratings locates at the grating lines, a position that coincides with that of the electric field maximum.
230.1950 Diffraction gratings 320.2250 Femtosecond phenomena 320.5520 Pulse compression 
Chinese Optics Letters
2013, 11(10): 102302

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